UHV System 1

UHV System 1:

• Chamber for substrate preparation (sputtering, annealing to 800°C), equipped with XPS, UPS,  and LEED
• Chamber for reactive thin film deposition by thermal evaporation (Knudsen cells for Ag, Au, Mg, Cu, Fe, Ni, Cr) and e-beam deposition (Ce, Nb) in UHV or O₂ pressure
• Chamber for morphological characterization with Omicron AFM/STM RT

Contact Person/Responsibles: Dr. Paola Luches

Ownership: UNIMORE, Department of Physics, Informatics and Mathematics

Funding Agency: Fondazione Cassa di Risparmio di Modena

Ongoing/Active Collaborations:

• Dr. Patrick O’Keeffe, Dr. Daniele Catone, CNR ISM, Roma
• Dr. Chris Milne, European XFEL, Schenefeld, Germany
• Prof. Federico Boscherini, Dr. Piero Torelli, CNR-IOM, Trieste
• Prof. David Cooke, McGill University, Montreal, Canada