PVD magnetron sputtering:

  • Target materials: ZnO, SiO2, In2O3, Al:ZnO, Nb, Al, Ti, and many other
  • Sputter coating of a wide range of substrate materials like Si, quartz, metals, polymers and TEM grids
  • Two 500 Watt DC supplies and two RF supplies with matching networks Working gas: Ar, O2, N2

Contact Person/Responsibles: Dr. Alessandro di Bona, Dr. Stefania Benedetti

Ownership: CNR

Funding Agency: Fondazione Cassa di Risparmio di Modena and MUR PNRR Ecosister

Ongoing/Active Collaborations:

  • Prof. Cantarella, UNIMORE
  • Dr. Alberto Ghirri, CNR NANO, Modena
  • Dr. Francesco Bisio, CNR SPIN, Genova
  • Dr. Ambra Fioravanti, CNR STEMS, Ferrara
  • Prof. Alexandra Boltasseva, Purdue University, USA
  • Dr. F. Lima, C. Milne, EuXFEL, Hamburg

University Strategic Lines:

  • Linea Strategica di Ateneo alla quale si allinea la macchina