Electron Beam Lithography:

  • A field-emission Scanning Electron Microscope (ZEISS Sigma) with a Raith Elphy Quantum Pattern generator for electron beam exposure control.
  • Beam energy up to 30 keV and best resolution of 2 nm down to low keVs thanks to the electrostatic Gemini column.

Contact Person/Responsibles: Prof. Alberto Rota

Ownership: CNR

Funding Agency: CNR and Fondazione Cassa di Risparmio di Modena

Ongoing/Active Collaborations:

  • The instrument works as a facility for CNR-NANO and FIM

University Strategic Lines:

  • Part of NANOFAB Lab, CNR-NANO